1: Features

Vacuum chamber size: Φ600-1800mm; 60-point/80-point optical thickness monitoring; Equipped with an ion source featuring uniformly distributed high ion current density; Dual electron guns; Multi-point and ring-type crucibles capable of depositing over 100 layers; Fully automated deposition process using an automatic deposition control system; Workpiece holder options include bell jar or planetary types; Exhaust system options include diffusion pump + cryogenic condenser (POLYCOLD) or cryopump; Specification equipment name

(Sales Technical Manager Yang: 181-030-45976)

2: Specifications

OTFC-1300CBI/DBI Vacuum chamber: SUS304, φ1300mm×1610mm (H); Workpiece holder: φ1130mm; Workpiece holder rotation speed: 10rpm to 50rpm (variable); Optical thickness control: HOM2-R-VIS350A optical thickness monitor

Wavelength range: 350nm to 1100nm

Reflective/transmissive crystal thickness gauge: XTC/3+6-point crystal sensor; Evaporation source: 2 sets of electron guns; Ion source: 17cm RF ion source; Exhaust system: Mechanical pump + 2 diffusion pumps + Polycold (or 2 cryopumps)

3: Performance

Achievable pressureBelow 7.0×10?? Pa; Exhaust time: 15 minutes (atmospheric pressure to 1.3×10?3 Pa); Substrate temperature: Maximum 350°C; Operating conditions: Equipment dimensions approximately 5000mm (W)×6500mm (D)×3500mm (H); Power supply: 3-phase, 200V, 50/60Hz, approximately 104KVA; Water flow rate: 140 liters/min or above; Air pressure: 0.5MPa or above; Weight: approximately 8500kg