The 435 nm notch filter is a band-stop filter that achieves deep blocking with OD2-OD6 near the center wavelength of 435 nm (typical stopband 415-455 nm, bandwidth ≈40 nm), attenuating light in this band to <0.1%, while maintaining high transmission of >85-90% in the 380-400 nm and 470-780 nm bands. Its core employs a multilayer dielectric thin-film interference design, coated with over 108 nanoscale layers on UV-grade fused silica or K9 glass substrate, with a total thickness of approximately 14 μm. It features dense film layers, scratch resistance, and laser damage resistance.

Main Applications:

• Fluorescence microscopy/endoscopy: Blocks 435 nm excitation light, allowing only fluorescence signals to reach the detector, improving signal-to-noise ratio

• Raman spectroscopy: Suppresses laser lines to acquire low-wavenumber Raman peaks

• Laser protection: Selectively blocks blue laser light while maintaining high visible light transmission

• Multispectral imaging: Eliminates specific laser interference for precise band imaging