Product Overview of LC-9000 Full Spectrum Direct Reading Spectrometer Computer-Controlled Spectrometer

The LC-9000 is a high-performance, flexible benchtop full-spectrum direct reading spectrometer, newly designed by the company as a streamlined desktop spectrometer. It meets the requirements of users in smelting, metal manufacturing, and machining industries. Utilizing fully computer-controlled all-digital spark sources, CCD detection technology, and a unique vacuum optical chamber, it accurately measures non-metallic elements such as C, P, S, and various alloy element contents, achieving full-spectrum analysis. The measurement results are accurate, with excellent reproducibility and long-term stability.

Product Configuration and Features of LC-9000 Full Spectrum Direct Reading Spectrometer Computer-Controlled Spectrometer

1. The uniquely designed vacuum optical chamber ensures accurate measurement of non-metallic elements such as C, P, S, and various alloy element contents, providing precise results with excellent reproducibility and long-term stability.

2. The unique structural design of the vacuum optical chamber reduces the volume of the vacuum chamber, with vacuum pumping speed less than half that of conventional spectrometers. The separation of the entrance window from the vacuum chamber allows for easy and quick daily cleaning and maintenance.

3. The optical system automatically performs spectral line scanning and automatic optical path calibration, ensuring the correctness of spectral line reception and eliminating the need for tedious peak scanning.

4. The unique excitation stand and argon gas path design significantly reduce argon consumption. The flexible sample clamp design accommodates various shapes and sizes of samples for on-site analysis.

5. Multi-matrix analysis can be achieved without additional hardware facilities, significantly reducing customer usage costs and expanding application scope compared to photomultiplier tube spectrometers.

6. Utilizing internationally advanced jet electrode technology, an argon jet stream forms around the electrode during excitation, preventing contact with external air and improving excitation precision.

7. The dedicated spectrometer operating software is fully compatible with Windows systems. It can also be equipped with various language versions based on customer needs. The software is user-friendly, allowing even personnel without prior spectrometer knowledge or experience to operate it after simple training.

8. Equipped with high-performance FPGA, DSP, and ARM processors, it features ultra-high-speed data acquisition and analysis capabilities, automatically monitoring and controlling the operational status of modules such as optical chamber temperature, vacuum level, argon pressure, and excitation light source in real time.

9. The fully digital plasma excitation source provides ultra-stable energy release in an argon environment for sample excitation. Full-digital excitation pulses ensure ultra-high resolution and high stability of the plasma energy output, meeting the excitation requirements of various materials.

10. The sample excitation stand features a copper spark stand base and tungsten electrodes. The copper base offers excellent heat dissipation and durability, while the tungsten electrodes provide long service life and high-temperature resistance, enhancing excitation performance. The self-purging electrode design creates an optimal environment for excitation and facilitates easier cleaning of the excitation stand and electrodes.

Main Technical Parameters

1. Analysis Matrix: Fe, Cu, Al, Ni, Ti, Co, Zn, Sn, Mg, Pb, etc.

2. Optical Structure: Paschen-Runge Rowland circle full-spectrum vacuum optical system

3. Wavelength Range: 160-650 nm

4. Focal Length: 400 mm

5. Grating Ruling: 3000 lines/mm

6. Detector: High-performance CCD array, each CCD with 3,648 pixels

7. CCD Pixel Resolution: 6 pm

8. Electrode: Tungsten jet electrode

9. Analysis Gap: Sample stage analysis gap: 4 mm

10. Light Source Type: New adjustable digital light source, High Energy Pre-burn Technology (HEPS)

11. Excitation Frequency: 100-1000 Hz

12. Maximum Discharge Current: 400 A

13. Vacuum System: Vacuum software automatic control and monitoring