The PTFE cleaning tank is an upgraded version following the PTFE cleaning barrel, specifically designed for industries such as semiconductors, photovoltaics, and optoelectronics. It is integrally molded, eliminating concerns about leakage. It is primarily used for soaking and cleaning baskets containing chips, silicon wafers, and battery cells. Due to its resistance to the corrosiveness of cleaning solutions, low metal element content, and absence of dissolution or precipitation, it does not contaminate chips, wafers, etc.
Semiconductor wafer cleaning tank dimensions can be customized as required. Additionally, matching lids can be customized to prevent contamination.
II. Features:
2. Resistant to high and low temperatures: -200°C to +260°C
3. Corrosion-resistant: withstands strong acids, strong alkalis, aqua regia, hydrofluoric acid, and various organic solvents;
4. Insulation-resistant: dielectric performance is independent of temperature and frequency;
5. Anti-contamination: low background values, with lead and uranium metal element content less than 0.01 ppb;
6. Low dissolution and precipitation, ensuring no contamination of chips, wafers, silicon wafers, etc.;
8. Chemically stable with good recoverability and resistance to deformation;
9. Made of Teflon plastic, durable and shatter-resistant.